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气体压力施压是实现纳米压印技术中将模板压入转移介质的重要技术路径,在克服应力不均匀、保护基片和模板等方面优势明显。报道了一种旨在提高压印压力均匀性、低压力施压的真空负压紫外固化纳米压印系统的研制。制备真空腔室,腔室顶部利用弹性橡胶环结合紫外透过性好的SiO2玻璃与腔体连接,采用抽真空的方式形成负压,腔室外大气压强通过SiO2玻璃均匀地作用到压印模板上,将其压入液态紫外敏感光刻胶中,再采用紫外光固化光刻胶,分离后实现模板图形向基板的转移。压印力大小取决于腔室内外的气体压强差,通过调节腔室内部气压大小改变施加在模板上的实际压力,内部气压大小通过连通气压表观察。图形转移实验结果表明,所研制纳米压印样机系统能够实现图形的高保真转移,在基片上形成光刻胶材质的结果图形,500nm特征线宽图形转移实验结果清晰,在较大面积基片上的压印压力均匀性良好。
Abstract：The air cushion press is an important technology to press the mold into the resist in nanoimprint.Its advantages are obviously in overcoming uneven stress and protecting mold and wafer.Based on the black vacuum and ultraviolet light exposed,a novel nanoimprint system to improve the uniform pressure and low pressure was reported.A vacuum chamber was made,the top of the chamber was connected with the cavity by an elastic ring and a SiO2 glass with good ultraviolet transmission.When the black vacuum was achieved,the atmospheric pressure began to exert the uniform pressure on the mold through the SiO2 glass and the mold was pressed into the liquid ultraviolet light sensitive resist,which was later solidified by the ultraviolet light.After the mold was seperated from the wafer,the patterning was realized.The pressure was determined by the difference between the atmospheric pressure and pressure inside the chamber.The actual pressure on the mold was changed with the inner air volume,which was indicated by the barometer. The results of the patterning experiment show that the resist pattern clearly appears on the wafer with feature size of 500 nm and the pressure on the mold manifolded is of excellent uniformity over a large patterning area,which indicates that the nanoimprint system can replicate features with high fidelity.
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基本信息:
中图分类号:TN305.7
引用信息:
[1]段智勇,弓巧侠,罗康,等.紫外固化真空负压纳米压印系统的研制[J].微纳电子技术,2010,47(07):432-436.
基金信息:
国家自然基金资助项目(10974183/A040411)
2010-07-15
2010-07-15